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The Evolution of Polishing Processes In materials science, semiconductor failure analysis, and metallographic inspection, the surface planarity and cleanliness of samples are critical factors determining the quality of microscopic imaging. For decades, researchers have relied on mounting wax to secure small or irregularly shaped samples. However, as the resolution of electron microscopes (SEM/TEM) has improved, the drawbacks associated with traditional wax-mounting techniques have become increasingly problematic.

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